The semiconductor industry has the most stringent requirements for cleaning agents among all industrial sectors. Even micron-level particles or ppb-level ionic contamination can lead to significant chip yield reduction.
Key Indicators
1. Particle Control: ≥0.5μm particle count controlled below 25/mL (SEMI standard), below 10/mL for advanced processes. 2. Metal Ion Content: Each metal ion controlled at 1-10ppb level. 3. Chloride Ion Content: Controlled below 10ppb. 4. NVR (Non-Volatile Residue): Requirement ≤1μg/cm².
Tansochem's Semiconductor-Grade Product
The TS-100 Precision Electronic Hydrocarbon Cleaner has been SGS tested with total metal ions <5ppb, particles (<0.5μm) <15/mL, NVR <0.5μg/cm², fully meeting the cleanliness requirements of semiconductor packaging and high-end PCB manufacturing.